Fabrication parameters dependent morphology variation of silicon thin film

Fabrication parameters dependent morphology variation of silicon thin film

Achieving two dimensional quantum structure of silicon with welldefined tuneable morphology is an outstanding issue. We present the preliminary results on fabrication parameters dependent silicon thin film production using VHF-PECVD method. Five samples are prepared on Si(100) substrate with gold (A...

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Bibliographic Details
Main Authors: Hamzah, Khaidzir, Mohd. Yassin, Muhammad Abdullah Izat, Hasanudin, Muhammad Akmal, Ghoshal, Sib Krishna, Ismail, Abd. Khamim
Format: Conference or Workshop Item
Language:English
Published: 2015
Subjects:
QD Chemistry
Online Access:http://eprints.utm.my/id/eprint/63450/1/AbdKhamimIsmail2015_FabricationParametersDependentMorphologyVariationofSiliconThinFilm.pdf
http://eprints.utm.my/id/eprint/63450/
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Institution: Universiti Teknologi Malaysia
Language: English

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http://eprints.utm.my/id/eprint/63450/1/AbdKhamimIsmail2015_FabricationParametersDependentMorphologyVariationofSiliconThinFilm.pdf
http://eprints.utm.my/id/eprint/63450/

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