Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells

A suitable combination of window and absorber layers plays a vital role in the fabrication of an efficient solar cell system. Here, we report the investigations concerning tin antimony sulfide, SnSb4S7 (TAS) thin film as an n-type window layer, prepared on the cleaned glass substrate via thermal eva...

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Main Authors: Ali, N., Hussain, A., Ahmed, R., Shamsuri, W. N. W., Abdel-Salam, N. M., Khenata, R.
Format: Article
Published: Springer Verlag 2017
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Online Access:http://eprints.utm.my/id/eprint/75328/
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85016409216&doi=10.1007%2fs00339-017-0879-4&partnerID=40&md5=ffaf5116390e23ea00b56c1ab6788a81
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Institution: Universiti Teknologi Malaysia
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spelling my.utm.753282018-03-27T06:12:58Z http://eprints.utm.my/id/eprint/75328/ Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells Ali, N. Hussain, A. Ahmed, R. Shamsuri, W. N. W. Abdel-Salam, N. M. Khenata, R. QC Physics A suitable combination of window and absorber layers plays a vital role in the fabrication of an efficient solar cell system. Here, we report the investigations concerning tin antimony sulfide, SnSb4S7 (TAS) thin film as an n-type window layer, prepared on the cleaned glass substrate via thermal evaporation technique. The obtained 150 nm thin films were annealed at 150, 200, 250, and 300 °C in an argon atmosphere, and then analyzed to get insight about its potential in a solar cell as an n-type window layer. The resistance of the films, determined via Van der Pauw technique, is found to be decreased (76–52 MΩ) with increasing annealing temperature. XRD analysis showed that the calculated crystallite size of the sample annealed at 300 °C was around 16 ± 0.5 nm, which is consistent with the characteristic range of window layer. Moreover, the calculated band gap (2.3–2.85 eV), low absorbance, and high transmittance values in the visible range also endorse the potential of TAS thin film for window layer. Springer Verlag 2017 Article PeerReviewed Ali, N. and Hussain, A. and Ahmed, R. and Shamsuri, W. N. W. and Abdel-Salam, N. M. and Khenata, R. (2017) Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells. Applied Physics A: Materials Science and Processing, 123 (4). ISSN 0947-8396 https://www.scopus.com/inward/record.uri?eid=2-s2.0-85016409216&doi=10.1007%2fs00339-017-0879-4&partnerID=40&md5=ffaf5116390e23ea00b56c1ab6788a81 DOI:10.1007/s00339-017-0879-4
institution Universiti Teknologi Malaysia
building UTM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Teknologi Malaysia
content_source UTM Institutional Repository
url_provider http://eprints.utm.my/
topic QC Physics
spellingShingle QC Physics
Ali, N.
Hussain, A.
Ahmed, R.
Shamsuri, W. N. W.
Abdel-Salam, N. M.
Khenata, R.
Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
description A suitable combination of window and absorber layers plays a vital role in the fabrication of an efficient solar cell system. Here, we report the investigations concerning tin antimony sulfide, SnSb4S7 (TAS) thin film as an n-type window layer, prepared on the cleaned glass substrate via thermal evaporation technique. The obtained 150 nm thin films were annealed at 150, 200, 250, and 300 °C in an argon atmosphere, and then analyzed to get insight about its potential in a solar cell as an n-type window layer. The resistance of the films, determined via Van der Pauw technique, is found to be decreased (76–52 MΩ) with increasing annealing temperature. XRD analysis showed that the calculated crystallite size of the sample annealed at 300 °C was around 16 ± 0.5 nm, which is consistent with the characteristic range of window layer. Moreover, the calculated band gap (2.3–2.85 eV), low absorbance, and high transmittance values in the visible range also endorse the potential of TAS thin film for window layer.
format Article
author Ali, N.
Hussain, A.
Ahmed, R.
Shamsuri, W. N. W.
Abdel-Salam, N. M.
Khenata, R.
author_facet Ali, N.
Hussain, A.
Ahmed, R.
Shamsuri, W. N. W.
Abdel-Salam, N. M.
Khenata, R.
author_sort Ali, N.
title Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
title_short Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
title_full Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
title_fullStr Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
title_full_unstemmed Fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
title_sort fabrication and characterization of 150 nm tin antimony sulfide thin films, a promising window layer material for homojunction solar cells
publisher Springer Verlag
publishDate 2017
url http://eprints.utm.my/id/eprint/75328/
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85016409216&doi=10.1007%2fs00339-017-0879-4&partnerID=40&md5=ffaf5116390e23ea00b56c1ab6788a81
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