Fullerene (C60) and its Derivatives as Resists for Electron Beam Lithography
The application of fullerene as a negative resist was first studied by Tada and Kanayama who verified that this material could be used as a negative electron beam resist. Its small molecule enables the resist to have a resolution of at least 20 nm. Robinson et al. demonstrated that chemical modifica...
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| Format: | Book Section |
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Springer
2011
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| Online Access: | http://eprints.utp.edu.my/4687/1/Book_cover.pdf http://eprints.utp.edu.my/4687/2/Ch-3.pdf http://eprints.utp.edu.my/4687/ |
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| Institution: | Universiti Teknologi Petronas |
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