Chemically amplified molecular resists for electron beam lithography
Molecular resists, such as fullerene and triphenylene derivatives, use small carbon rich molecules, which give the potential for greater resolution, lower line edge roughness and higher etch durability than traditional polymeric materials. Their main limitation has been low sensitivity to irradiat...
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| Main Authors: | , |
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| Format: | Article |
| Published: |
2006
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| Subjects: | |
| Online Access: | http://eprints.utp.edu.my/882/1/Micro_Eng_2006.pdf http://eprints.utp.edu.my/882/ |
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| Institution: | Universiti Teknologi Petronas |