Fabrication and morphology charaterization of spin-coated nafion thin films

Nafion thin films {<2um) were fabricated using the spin coating technique. Substrate (silicon, silica and glass), concentration (5%, 10%, and 15% Nafion concentration), and spin coating angular velocity (1500rpm, 2000rpm, and 2500rpm) were chosen as the parameters. The deposition of the films ont...

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Bibliographic Details
Main Author: Tadios, John Stephen Jerome G.
Format: text
Published: Animo Repository 2012
Online Access:https://animorepository.dlsu.edu.ph/etd_bachelors/2644
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Institution: De La Salle University
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Summary:Nafion thin films {<2um) were fabricated using the spin coating technique. Substrate (silicon, silica and glass), concentration (5%, 10%, and 15% Nafion concentration), and spin coating angular velocity (1500rpm, 2000rpm, and 2500rpm) were chosen as the parameters. The deposition of the films onto the substrates was verified using energy-dispersive spectroscopy (EDX) and the surface morphology was characterized by scanning electron microscopy (SEM). The effects of varying the parameters were investigated. Surface morphological results show that the films followed the contour of the substrate onto which they are deposited and nanometer scratch-likes features appear at high magnification (x35000). Thickness measurements were graphed against the different parameters and results show that thickness of Nafion films decrease with increasing angular velocity and increase with increasing concentration. Results also show that silicon and silica produced thicknesses which are uniform while glass always achieved higher thicknesses than the two indicating that the kind of substrate affect the thickness of the deposited thin film.