Negative differential resistance in polymer tunnel diodes using atomic layer deposited, TiO2 tunneling barriers at various deposition temperatures

• Main Authors: Guttman, Jeremy J., Chambers, Conner B., Villagracia, Al Rey C., Santos, Gil Nonato C., Berger, Paul R.
• Format: text
• Published: Animo Repository 2017
• Subjects: Atomic layer deposition; Tunnel diodes; Titanium dioxide; Tunneling (Physics); Conjugated polymers; Physics
• Online Access: https://animorepository.dlsu.edu.ph/faculty_research/2013
• Institution: De La Salle University

Atomic layer deposition (ALD) presents a method to deposit uniform and conformal thin-film layers with a high degree of control and repeatability. Quantum functional devices that provide opportunities in low-power molecular and organic based memory and logic via thin metal-oxide tunneling layer were...