Low temperature photoresponse of monolayer tungsten disulphide

• Main Authors: Cao, Bingchen, Shen, Xiaonan, Shang, Jingzhi, Cong, Chunxiao, Yang, Weihuang, Eginligil, Mustafa, Yu, Ting
• Other Authors: School of Physical and Mathematical Sciences
• Format: Article
• Language: English
• Published: 2014
• Subjects: DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/102410; http://hdl.handle.net/10220/24276
• Institution: Nanyang Technological University

High photoresponse can be achieved in monolayers of transition metal dichalcogenides. However, the response times are inconveniently limited by defects. Here, we report low temperature photoresponse of monolayer tungsten disulphide prepared by exfoliation and chemical vapour deposition (CVD) method....