Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser
Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative textu...
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sg-ntu-dr.10356-1028672020-03-07T13:19:20Z Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser Farrokhi, Hamid Zhou, Wei Zheng, Hongyu Li, Zhongli School of Mechanical and Aerospace Engineering DRNTU::Engineering::Mechanical engineering Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative texturing of Si surface is possible if suitable laser power and dwell time are used to produce peak temperatures above 1250 K and below the Si melting point of 1690 K. Localized oxidation occurs in the temperature range and results in formation of regularly patterned bumps. 2014-04-10T03:22:27Z 2019-12-06T21:01:19Z 2014-04-10T03:22:27Z 2019-12-06T21:01:19Z 2014 2014 Journal Article Farrokhi, H., Zhou, W., Zheng, H., & Li, Z. (2014). Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser. Journal of Computational and Theoretical Nanoscience, 11(1), 53-57. https://hdl.handle.net/10356/102867 http://hdl.handle.net/10220/19209 10.1166/jctn.2014.3316 en Journal of computational and theoretical nanoscience © 2014 American Scientific Publishers. |
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DRNTU::Engineering::Mechanical engineering Farrokhi, Hamid Zhou, Wei Zheng, Hongyu Li, Zhongli Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
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Silicon is highly transparent to the infrared wavelength, so fiber laser with wavelength of 1090 nm is not regarded as a suitable tool for the purpose of ablation based surface texturing. However, we demonstrate, through finite element thermal analyses of laser irradiated surface, non-ablative texturing of Si surface is possible if suitable laser power and dwell time are used to produce peak temperatures above 1250 K and below the Si melting point of 1690 K. Localized oxidation occurs in the temperature range and results in formation of regularly patterned bumps. |
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School of Mechanical and Aerospace Engineering |
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School of Mechanical and Aerospace Engineering Farrokhi, Hamid Zhou, Wei Zheng, Hongyu Li, Zhongli |
format |
Article |
author |
Farrokhi, Hamid Zhou, Wei Zheng, Hongyu Li, Zhongli |
author_sort |
Farrokhi, Hamid |
title |
Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
title_short |
Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
title_full |
Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
title_fullStr |
Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
title_full_unstemmed |
Numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
title_sort |
numerical simulation of non-ablative laser texturing of silicon surface with a continuous wave fiber laser |
publishDate |
2014 |
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https://hdl.handle.net/10356/102867 http://hdl.handle.net/10220/19209 |
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1681042286957297664 |