Effect of annealing temperature on microstructure and UV light photocatalytic activity of TiO2 films grown by atmospheric pressure CVD

• Main Authors: Soutar, Andrew McIntosh, Ding, Xingzhao, Chua, Chin Sheng, Fang, Xiaoqin, Chen, Xiaofeng, Tan, Ooi Kiang, Tse, Man Siu
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2015
• Subjects: DRNTU::Science::Chemistry; DRNTU::Science::Chemistry::Crystallography::Chemical crystallography
• Online Access: https://hdl.handle.net/10356/106685; http://hdl.handle.net/10220/25098; http://dx.doi.org/10.1002/cvde.201207015
• Institution: Nanyang Technological University

Titanium dioxide (TiO2) films are deposited on quartz substrates by atmospheric pressure (AP)CVD, and then annealed under simulated air (80% nitrogen, 20% oxygen) at temperatures from 600 to 900 °C to investigate the change in microstructure and the effect on the photocatalytic activity on the simul...