Direct growth of nanocrystalline hexagonal boron nitride films on dielectric substrates

• المؤلفون الرئيسيون: Tay, Roland Yingjie, Tsang, Siu Hon, Loeblein, Manuela, Chow, Wai Leong, Loh, Guan Chee, Toh, Joo Wah, Ang, Soon Loong, Teo, Edwin Hang Tong
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2015
• الموضوعات: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/107211; http://hdl.handle.net/10220/25319
• المؤسسة: Nanyang Technological University

Atomically thin hexagonal-boron nitride (h-BN) films are primarily synthesized through chemical vapor deposition (CVD) on various catalytic transition metal substrates. In this work, a single-step metal-catalyst-free approach to obtain few- to multi-layer nanocrystalline h-BN (NCBN) directly on amor...