Chemically active plasmas for deterministic assembly of nanocrystalline SiC film
Silicon carbide thin films are self-assembled onto crystalline silicon substrate from a sintered SiC target at low substrate temperature of 400 °C in Ar + H2 discharge using inductively coupled plasma (ICP) assisted RF magnetron sputtering system. Surface morphology and structural properties of SiC...
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格式: | Article |
語言: | English |
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2013
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在線閱讀: | https://hdl.handle.net/10356/94474 http://hdl.handle.net/10220/9392 |
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