Chemically active plasmas for deterministic assembly of nanocrystalline SiC film

• المؤلفون الرئيسيون: Cheng, Q. J., Long, J. D., Chen, Zhong, Xu, Shuyan
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/94474; http://hdl.handle.net/10220/9392
• المؤسسة: Nanyang Technological University

Silicon carbide thin films are self-assembled onto crystalline silicon substrate from a sintered SiC target at low substrate temperature of 400 °C in Ar + H2 discharge using inductively coupled plasma (ICP) assisted RF magnetron sputtering system. Surface morphology and structural properties of SiC...