Effects of Si(001) surface amorphization on ErSi2 thin film

• Main Authors: Pey, Kin Leong, Lee, Pooi See, Tan, Eu Jin, Kon, M. L., Zhang, Y. W., Wang, W. D., Chi, Dong Zhi
• 其他作者: School of Electrical and Electronic Engineering
• 格式: Article
• 語言: English
• 出版: 2013
• 主題: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• 在線閱讀: https://hdl.handle.net/10356/99843; http://hdl.handle.net/10220/10497
• 機構: Nanyang Technological University

In a materials study of ErSi2/Si(001) as a potential candidate for Schottky source/drain NMOS application, the properties of ErSi2 thin film were investigated with varying degrees of Si(001) surface amorphization. The amorphization was carried out by in situ Ar plasma cleaning and Si pre-amorphizati...