Chemically active plasmas for deterministic assembly of nanocrystalline SiC film

• Main Authors: Cheng, Q. J., Long, J. D., Chen, Zhong, Xu, Shuyan
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: https://hdl.handle.net/10356/94474; http://hdl.handle.net/10220/9392
• Institution: Nanyang Technological University

Silicon carbide thin films are self-assembled onto crystalline silicon substrate from a sintered SiC target at low substrate temperature of 400 °C in Ar + H2 discharge using inductively coupled plasma (ICP) assisted RF magnetron sputtering system. Surface morphology and structural properties of SiC...