Atomic structure of grain boundaries for layered molybdenum disulfide (MoS2)

• المؤلف الرئيسي: Cheah, Shun Yee
• مؤلفون آخرون: Liu Zheng
• التنسيق: Final Year Project
• اللغة: English
• منشور في: Nanyang Technological University 2020
• الموضوعات: Engineering::Materials::Material testing and characterization
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/138860
• المؤسسة: Nanyang Technological University

A study on the atomic structure characterization of grain boundary for monolayered molybdenum disulphide (MoS2) by using aberration-corrected scanning transmission electron microscope (STEM) techniques. The MoS2-MoSe2 heterostructure thin film on silicon wafer are firstly grown by chemical vapour de...