Atomic layer deposition process of ruthenium, iridium and rhodium thin films

• المؤلف الرئيسي: Yeo, Ke Jun
• مؤلفون آخرون: Alfred Tok Iing Yoong
• التنسيق: Final Year Project
• اللغة: English
• منشور في: Nanyang Technological University 2021
• الموضوعات: Engineering::Materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/147710
• المؤسسة: Nanyang Technological University

The thin film industry has shown growth in the recent years, as devices become smaller and more powerful. Thin film desposition technique such as Atomic Layer Deposition (ALD) has shown increasing attractiveness in the modern industry. The ability to deposit films with high conformality and uniformi...