Atomic layer deposition process of ruthenium, iridium and rhodium thin films

The thin film industry has shown growth in the recent years, as devices become smaller and more powerful. Thin film desposition technique such as Atomic Layer Deposition (ALD) has shown increasing attractiveness in the modern industry. The ability to deposit films with high conformality and uniformi...

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Bibliographic Details
Main Author: Yeo, Ke Jun
Other Authors: Alfred Tok Iing Yoong
Format: Final Year Project
Language:English
Published: Nanyang Technological University 2021
Subjects:
Online Access:https://hdl.handle.net/10356/147710
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Institution: Nanyang Technological University
Language: English

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