Atomic layer deposition (ALD) of TiO2 films for photocatalytic application.

• Main Author: Choudhury Anshuman Das.
• Other Authors: Tan Thatt Yang Timothy
• Format: Final Year Project
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering::Chemical engineering::Industrial photochemistry
• Online Access: http://hdl.handle.net/10356/16647
• Institution: Nanyang Technological University

The field of photocatalysis can be traced back more than 80 years in history and during the past 20 years, it has become an extremely well researched field due to practical interest in air and water remediation, self-cleaning surfaces, and self-sterilizing surfaces. The following FYP project explore...