Atomic layer deposition (ALD) of TiO2 films for photocatalytic application.

• 主要作者: Choudhury Anshuman Das.
• 其他作者: Tan Thatt Yang Timothy
• 格式: Final Year Project
• 語言: English
• 出版: 2009
• 主題: DRNTU::Engineering::Chemical engineering::Industrial photochemistry
• 在線閱讀: http://hdl.handle.net/10356/16647

The field of photocatalysis can be traced back more than 80 years in history and during the past 20 years, it has become an extremely well researched field due to practical interest in air and water remediation, self-cleaning surfaces, and self-sterilizing surfaces. The following FYP project explore...