Atomic layer deposition of metallic tri-layer for alloy formation

• المؤلف الرئيسي: Yong, Sidney Kwong Roong
• مؤلفون آخرون: Alfred Tok Iing Yoong
• التنسيق: Final Year Project
• اللغة: English
• منشور في: Nanyang Technological University 2022
• الموضوعات: Engineering::Materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/156175
• المؤسسة: Nanyang Technological University

Research has brought about great interest in the field of thin films and its applications. With the need for increasingly smaller devices, there is an increasing demand for synthesis methods to control and precisely fabricate components and materials. Atomic layer deposition (ALD) has become a topic...