Atomic layer deposition of metallic tri-layer for alloy formation

Research has brought about great interest in the field of thin films and its applications. With the need for increasingly smaller devices, there is an increasing demand for synthesis methods to control and precisely fabricate components and materials. Atomic layer deposition (ALD) has become a topic...

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Bibliographic Details
Main Author: Yong, Sidney Kwong Roong
Other Authors: Alfred Tok Iing Yoong
Format: Final Year Project
Language:English
Published: Nanyang Technological University 2022
Subjects:
Online Access:https://hdl.handle.net/10356/156175
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Institution: Nanyang Technological University
Language: English
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