Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition

Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition

10.1063/1.1534381

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Bibliographic Details
Main Authors: Ho, M.-Y., Gong, H., Wilk, G.D., Busch, B.W., Green, M.L., Voyles, P.M., Muller, D.A., Bude, M., Lin, W.H., See, A., Loomans, M.E., Lahiri, S.K., Räisänen, P.I.
Other Authors: MATERIALS SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/107131
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/107131

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