Acute encephalitis secondary to an ovarian teratoma

by See, A.T., Woo, Y.L., Crawford, R.
Published 2012

Effects of poly-Si annealing on gate oxide charging damage in Poly-Si gate etching process

by Chong, D., Yoo, W.J., Chan, L., See, A.
Published 2014

Effect of degree of amorphization of Si on the formation of titanium silicide

by Tan, C.C., Lu, L., See, A., Chan, L.
Published 2014

Effect of silicon substrate amorphization on the kinetics of reaction between a titanium thin film and silicon

by Tan, C.C., Lu, L., See, A., Chan, L.
Published 2014

Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID

by Cha, C.L., Vassiliev, V., Chor, E.F., See, A.K.
Published 2014

Crystallographic orientation of Ta/TaN bilayer and its effect on seed and bulk Cu 〈111〉 formation

by Ho, C.S., Liew, S.L., See, A., Lim, C.Y.H.
Published 2014

Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

by Cho, B.J., Poon, D., Tan, L.S., Bhat, M., See, A.
Published 2014

Effect of transmission line pulsing of interconnects investigated using combined low-frequency noise and resistance measurements

by Chu, L.W., Chim, W.K., Pey, K.L., See, A.
Published 2014

Investigation of active Si pitting and its impact on 0.15 and 0.30 μm n-type metal-oxide-semiconductor and p-type metal-oxide-semiconductor transistors

by Chua, C.S., Chor, E.F., Goh, F., See, A., Chan, L.
Published 2014

Mechanism of simultaneous formation of refractory-metal free C40 and C49 TiSi2 induced by Q-switched Nd: Yttrium-aluminum-garnet laser irradiation

by Tan, S.C., See, A., Yu, T., Shen, Z.X., Lin, J.
Published 2014

Effects of oxygen flooding on crater bottom composition and roughness in ultrashallow secondary ion mass spectrometry depth profiling

by Ng, C.M., Wee, A.T.S., Huan, C.H.A., See, A.
Published 2014

Ultra shallow depth profiling of B deltas in Si using a CAMECA IMS 6f

by Ng, C.M., Wee, A.T.S., Huan, C.H.A., See, A.
Published 2014

Investigation of active Si pitting and its impact on 0.15 and 0.30 μm n-type metal-oxide-semiconductor and p-type metal-oxide-semiconductor transistors

by Chua, C.S., Chor, E.F., Goh, F., See, A., Chan, L.
Published 2014

Ultra shallow secondary ion mass spectrometry depth profiling: Limitation of sample rotation in improving depth resolution

by Ng, C.M., Wee, A.T.S., Huan, C.H.A., See, A.
Published 2014

Boron profile narrowing in laser-processed silicon after rapid thermal anneal

by Poon, C.H., Tan, L.S., Cho, B.J., See, A., Bhat, M.
Published 2014

Mask error enhancement factor for sub 0.13μm lithography

by Tan, S.K., Lin, Q., Quan, C., Tay, C.J., See, A.
Published 2014

Impact of indium and boron interaction on device performance for short and narrow channel n-metal oxide semiconductor field effect transistors

by Ong, S.Y., Chor, E.F., Lee, J., See, A., Chan, L.
Published 2014

Enhancement Effect of C40 TiSi2 on the C54 Phase Formation

by Chen, S.Y., Shen, Z.X., See, A.K., Chan, L.H.
Published 2014

Layer inversion of Ni(Pt)Si on mixed phase Si films

by Lee, P.S., Pey, K.L., Mangelinck, D., Ding, J., Osipowicz, T., See, A.
Published 2014

SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates

by Yeo, K.L., Wee, A.T.S., Liu, R., Ng, C.M., See, A.
Published 2014