Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

• Main Authors: Cho, B.J., Poon, D., Tan, L.S., Bhat, M., See, A.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/71059

Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004