Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004

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Bibliographic Details
Main Authors: Cho, B.J., Poon, D., Tan, L.S., Bhat, M., See, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71059
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/71059

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