Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

• Main Authors: Cho, B.J., Poon, D., Tan, L.S., Bhat, M., See, A.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/71059
• Institution: National University of Singapore

Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004