Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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Main Authors: | , , , , |
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Other Authors: | |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82734 |
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Institution: | National University of Singapore |