Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors: Poon, C.H., Cho, B.J., Lu, Y.F., Bhat, M., See, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82734
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Institution: National University of Singapore