Impact of nitrogen implantation into polysilicon followed by drive-in process on gate oxide integrity

by Cho, B.J., Ko, L.H., Nga, Y.A., Chan, L.H.
Published 2014

Enhancement Effect of C40 TiSi2 on the C54 Phase Formation

by Chen, S.Y., Shen, Z.X., See, A.K., Chan, L.H.
Published 2014

Study of titanium suicide formation using spike anneal for integrated chip manufacturing

by Tan, C.C., Lu, L., Lai, C.W., See, A., Chan, L.H.
Published 2014

Characterisation of metal pattern density and metal stack composition on chlorine residues from the metal etch process

by Loong, S.Y., Lee, H.K., Zhou, M.S., Chan, L.H., Premachandran, V.
Published 2014

Synthesis and characterization of pure C40 TiSi2

by Chen, S.Y., Shen, Z.X., Li, K., See, A.K., Chan, L.H.
Published 2014

Laser-induced direct formation of C54 TiSi2 films with fine grains on c-Si substrates

by Chen, S.Y., Shen, Z.X., Chen, Z.D., Chan, L.H., See, A.K.
Published 2014

Integrity of copper-tantalum nitride metallization under different ambient conditions

by Yap, K.P., Gong, H., Dai, J.Y., Osipowicz, T., Chan, L.H., Lahiri, S.K.
Published 2014

Thermal stability study of NiSi and NiSi2 thin films

by Zhao, F.F., Zheng, J.Z., Shen, Z.X., Osipowicz, T., Gao, W.Z., Chan, L.H.
Published 2014

Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technology

by Chen, S.Y., Shen, Z.X., Xu, S.Y., See, A.K., Chan, L.H., Li, W.S.
Published 2014

Synthesis of pure C40 TiSi2 for Si wafer fabrication

by Chen, S.Y., Shen, Z.X., Xu, S.Y., See, A.K., Chan, L.H., Li, W.S.
Published 2014

Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication

by Chen, S.Y., Shen, Z.X., Xu, S.Y., Ong, C.K., See, A.K., Chan, L.H.
Published 2014

Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching

by Low, C.H., Chin, W.S., Tan, K.L., Loh, F.C., Zhou, M., Zhong, Q.H., Chan, L.H.
Published 2014

A robust and production worthy addressable array architecture for deep sub-micron MOSFET's matching characterization

by Yeo, S.B., Bordelon, J., Chu, S., Li, M.F., Tranchina, B.A., Harward, M., Chan, L.H., See, A.
Published 2014

Enhancement or reduction of catalytic dissolution reaction in chemically amplified resists by substrate contaminants

by Soo, C.P., Valiyaveettil, S., Huan, A., Wee, A., Ang, T.C., Fan, M.H., Bourdillon, A.J., Chan, L.H.
Published 2014

Applications of micro-Raman spectroscopy in salicide characterization for Si device fabrication

by Zhao, F.F., Chen, S.Y., Shen, Z.X., Gao, X.S., Zheng, J.Z., See, A.K., Chan, L.H.
Published 2014

Improvement on lithography pattern profile by plasma treatment

by Soo, C.P., Bourdillon, A.J., Valiyaveettil, S., Huan, A., Wee, A., Fan, M.H., Ang, T.C., Chan, L.H.
Published 2014

Integration of SALICIDE process for deep-submicron CMOS technology: Effect of nitrogen/argon-amorphized implant on SALICIDE formation

by Ho, C.S., Pey, K.L., Wong, H., Karunasiri, R.P.G., Chua, S.J., Lee, K.H., Chan, L.H.
Published 2014

Laser-induced formation of titanium silicides

by Chen, S.Y., Shen, Z.X., Chen, Z.D., See, A.K., Chan, L.H., Zhang, T.J., Tee, K.C.
Published 2014

Approach to interface roughness of silicide thin films by micro-Raman imaging

by Zhao, F.F., Sun, W.X., Feng, Y.P., Zheng, J.Z., Shen, Z.X., Pang, C.H., Chan, L.H.
Published 2014

A new field dependent mobility model for high frequency channel thermal noise of deep submicron RFCMOS

by Ong, Shih Ni, Yeo, Kiat Seng, Chew, Kok Wai Johnny, Chan, L. H. K., Loo, Xi Sung, Boon, Chirn Chye, Do, Manh Anh
Published 2013