Characterisation of metal pattern density and metal stack composition on chlorine residues from the metal etch process

Characterisation of metal pattern density and metal stack composition on chlorine residues from the metal etch process

10.1117/12.324025

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Bibliographic Details
Main Authors: Loong, S.Y., Lee, H.K., Zhou, M.S., Chan, L.H., Premachandran, V.
Other Authors: CHEMISTRY
Format: Conference or Workshop Item
Published: 2014
Subjects:
Capillary Electrophoresis
Chlorine
Corrosion
Failure
Metal etching
Online Access:http://scholarbank.nus.edu.sg/handle/10635/77412
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/77412

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