Study of process dependent reliability in SiOC dielectric interconnects and film

由 Mok, T.S., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Impact of buried capping layer on electrical stablity of advanced interconnects

由 Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Electric field-enhanced degradation of porous methylsilsesquioxane polymer as observed by in situ FTIRS

由 Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 film

由 Chen, J., Yoo, W.J., Chan, D.S.H.
出版 2014

Effect of porosity on electrical stability of hydrocarbon polymeric low-k dielectric

由 Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A.
出版 2014

A time-dependent technique for carrier recombination and generation lifetime measurement in SOI MOSFET

由 Zhang, G., Yoo, W.J., Ling, C.H.
出版 2014

Hot-electron capture for CHEI programming in SONOS-type flash memory using high- κ trapping layer

由 Zhang, G., Yoo, W.J., Ling, C.-H.
出版 2014

In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching

由 Kok, K.W., Yoo, W.J., Sooriakumar, K.
出版 2014

Reliability improvement to copper damascene structures using buried capping layer

由 Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Effect of electric field on chemical bonds of carbon-doped silicon oxide as evidenced by in situ Fourier transform infrared spectroscopy

由 Yiang, K.Y., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Investigation of etching properties of metal nitride/high-k gate stacks using inductively coupled plasma

由 Hwang, W.S., Chen, J., Yoo, W.J., Bliznetsov, V.
出版 2014

Effects of poly-Si annealing on gate oxide charging damage in Poly-Si gate etching process

由 Chong, D., Yoo, W.J., Chan, L., See, A.
出版 2014

Self-assembly of Ni nanocrystals on HfO2 and N -assisted Ni confinement for nonvolatile memory application

由 Tan, Z., Samanta, S.K., Yoo, W.J., Lee, S.
出版 2014

Reliability improvement using buried capping layer in advanced interconnects

由 Yiang, K.Y., Mok, T.S., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Enhancement of adhesion strength of Cu layer on single and multi-layer dielectric film stack in Cu/low k multi-level interconnects

由 Balakumar, S., Wong, G., Tsang, C.F., Hara, T., Yoo, W.J.
出版 2014

Investigation of electrical conduction in carbon-doped silicon oxide using a voltage ramp method

由 Yiang, K.Y., Yoo, W.J., Guo, Q., Krishnamoorthy, A.
出版 2014

Study of leakage mechanisms of the copper/Black Diamond™ damascene process

由 Yiang, K.Y., Guo, Q., Yoo, W.J., Krishnamoorthy, A.
出版 2014

Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF

由 Hwang, W.S., Cho, B.-J., Chan, D.S.H., Yoo, W.J.
出版 2014

Reliability characterization of organic ultra low k film using ramp voltage breakdown

由 Krishnamoorthy, A., Murthy, B.R., Yiang, K.Y., Yoo, W.J.
出版 2014

Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric

由 Chen, J., Yoo, W.J., Chan, D.S.H., Kwong, D.-L.
出版 2014