Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
10.1149/1.1642577
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| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
2014
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82219 |
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| Institution: | National University of Singapore |