Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric

10.1149/1.1642577

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Main Authors: Chen, J., Yoo, W.J., Chan, D.S.H., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82219
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-822192023-10-30T23:02:37Z Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric Chen, J. Yoo, W.J. Chan, D.S.H. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.1642577 Electrochemical and Solid-State Letters 7 3 F18-F20 ESLEF 2014-10-07T04:26:47Z 2014-10-07T04:26:47Z 2004 Article Chen, J., Yoo, W.J., Chan, D.S.H., Kwong, D.-L. (2004). Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric. Electrochemical and Solid-State Letters 7 (3) : F18-F20. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1642577 10990062 http://scholarbank.nus.edu.sg/handle/10635/82219 000188700000021 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/1.1642577
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Chen, J.
Yoo, W.J.
Chan, D.S.H.
Kwong, D.-L.
format Article
author Chen, J.
Yoo, W.J.
Chan, D.S.H.
Kwong, D.-L.
spellingShingle Chen, J.
Yoo, W.J.
Chan, D.S.H.
Kwong, D.-L.
Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
author_sort Chen, J.
title Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
title_short Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
title_full Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
title_fullStr Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
title_full_unstemmed Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
title_sort effects of annealing and ar ion bombardment on the removal of hfo 2 gate dielectric
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82219
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