Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric
10.1149/1.1642577
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sg-nus-scholar.10635-822192023-10-30T23:02:37Z Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric Chen, J. Yoo, W.J. Chan, D.S.H. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.1642577 Electrochemical and Solid-State Letters 7 3 F18-F20 ESLEF 2014-10-07T04:26:47Z 2014-10-07T04:26:47Z 2004 Article Chen, J., Yoo, W.J., Chan, D.S.H., Kwong, D.-L. (2004). Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric. Electrochemical and Solid-State Letters 7 (3) : F18-F20. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1642577 10990062 http://scholarbank.nus.edu.sg/handle/10635/82219 000188700000021 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Chen, J. Yoo, W.J. Chan, D.S.H. Kwong, D.-L. |
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Article |
author |
Chen, J. Yoo, W.J. Chan, D.S.H. Kwong, D.-L. |
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Chen, J. Yoo, W.J. Chan, D.S.H. Kwong, D.-L. Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric |
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Chen, J. |
title |
Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric |
title_short |
Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric |
title_full |
Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric |
title_fullStr |
Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric |
title_full_unstemmed |
Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate Dielectric |
title_sort |
effects of annealing and ar ion bombardment on the removal of hfo 2 gate dielectric |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/82219 |
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