Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF

Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF

10.1116/1.2731339

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Bibliographic Details
Main Authors: Hwang, W.S., Cho, B.-J., Chan, D.S.H., Yoo, W.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56525
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/56525

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