Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF
10.1116/1.2731339
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sg-nus-scholar.10635-565252024-11-14T01:24:57Z Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF Hwang, W.S. Cho, B.-J. Chan, D.S.H. Yoo, W.J. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2731339 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 25 4 1056-1061 JVTAD 2014-06-17T02:55:36Z 2014-06-17T02:55:36Z 2007 Article Hwang, W.S., Cho, B.-J., Chan, D.S.H., Yoo, W.J. (2007). Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 25 (4) : 1056-1061. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2731339 07342101 http://scholarbank.nus.edu.sg/handle/10635/56525 000248491700070 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Hwang, W.S. Cho, B.-J. Chan, D.S.H. Yoo, W.J. |
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Hwang, W.S. Cho, B.-J. Chan, D.S.H. Yoo, W.J. |
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Hwang, W.S. Cho, B.-J. Chan, D.S.H. Yoo, W.J. Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF |
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Hwang, W.S. |
title |
Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF |
title_short |
Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF |
title_full |
Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF |
title_fullStr |
Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF |
title_full_unstemmed |
Low energy N2 ion bombardment for removal of (Hf O2) x (SiON)1-x in dilute HF |
title_sort |
low energy n2 ion bombardment for removal of (hf o2) x (sion)1-x in dilute hf |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/56525 |
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