Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID

Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

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Bibliographic Details
Main Authors: Cha, C.L., Vassiliev, V., Chor, E.F., See, A.K.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/50567
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/50567

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