ICP etching of RF sputtered and PECVD silicon carbide films

International Journal of Modern Physics B

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Bibliographic Details
Main Authors: Shi, J., Chor, E.F., Choi, W.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83811
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Institution: National University of Singapore