ICP etching of RF sputtered and PECVD silicon carbide films
International Journal of Modern Physics B
Saved in:
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
|
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83811 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-83811 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-838112024-11-14T00:57:16Z ICP etching of RF sputtered and PECVD silicon carbide films Shi, J. Chor, E.F. Choi, W.K. ELECTRICAL & COMPUTER ENGINEERING International Journal of Modern Physics B 16 6-7 1067-1071 IJPBE 2014-10-07T04:45:27Z 2014-10-07T04:45:27Z 2002-03-20 Conference Paper Shi, J.,Chor, E.F.,Choi, W.K. (2002-03-20). ICP etching of RF sputtered and PECVD silicon carbide films. International Journal of Modern Physics B 16 (6-7) : 1067-1071. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/83811 NOT_IN_WOS Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
International Journal of Modern Physics B |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Shi, J. Chor, E.F. Choi, W.K. |
| format |
Conference or Workshop Item |
| author |
Shi, J. Chor, E.F. Choi, W.K. |
| spellingShingle |
Shi, J. Chor, E.F. Choi, W.K. ICP etching of RF sputtered and PECVD silicon carbide films |
| author_sort |
Shi, J. |
| title |
ICP etching of RF sputtered and PECVD silicon carbide films |
| title_short |
ICP etching of RF sputtered and PECVD silicon carbide films |
| title_full |
ICP etching of RF sputtered and PECVD silicon carbide films |
| title_fullStr |
ICP etching of RF sputtered and PECVD silicon carbide films |
| title_full_unstemmed |
ICP etching of RF sputtered and PECVD silicon carbide films |
| title_sort |
icp etching of rf sputtered and pecvd silicon carbide films |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/83811 |
| _version_ |
1821181164318097408 |