Effects of hydrogen and rf power on the structural and electrical properties of rf sputtered hydrogenated amorphous silicon carbide films

Journal of Applied Physics

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Bibliographic Details
Main Authors: Choi, W.K., Loo, F.L., Loh, F.C., Tan, K.L.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80374
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Institution: National University of Singapore