Infra-red, X-ray photoelectron spectroscopy and electrical studies of r.f. sputtered amorphous silicon carbide films

Infra-red, X-ray photoelectron spectroscopy and electrical studies of r.f. sputtered amorphous silicon carbide films

Thin Solid Films

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Bibliographic Details
Main Authors: Han, L.J., Ong, T.Y., Prakash, S., Chua, L.G., Choi, W.K., Tan, L.S., Loh, F.C., Tan, K.L.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Amorphous silicon carbide
Annealing
FTIR
Sputtering
X-ray photoelectron spectroscopy
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80604
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/80604

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