Electrical characterisation of RF sputtered tantalum oxide films rapid thermal annealed with Ar, N2, O2 and N2O

Electrical characterisation of RF sputtered tantalum oxide films rapid thermal annealed with Ar, N2, O2 and N2O

Thin Solid Films

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Bibliographic Details
Main Authors: Choi, W.K., Tan, L.S., Lim, J.Y., Pek, S.G.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Rapid thermal annealing
Sputtering
Tantalum pentoxide
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80387
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/80387

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