Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing

Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing

10.1007/s10832-006-9909-x

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Bibliographic Details
Main Authors: Li, Q., Ong, C.K., Wang, S.J., Wang, W.D., Chi, D.Z., Huan, A.C.H.
Other Authors: BIOCHEMISTRY
Format: Conference or Workshop Item
Published: 2011
Subjects:
High-k dielectric thin films
Metal-oxide-semiconductor
Rapid thermal annealing
UHV sputtering
Online Access:http://scholarbank.nus.edu.sg/handle/10635/28959
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/28959

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