Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing
10.1007/s10832-006-9909-x
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2011
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sg-nus-scholar.10635-289592023-10-26T10:13:01Z Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing Li, Q. Ong, C.K. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. BIOCHEMISTRY PHYSICS High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering 10.1007/s10832-006-9909-x Journal of Electroceramics 16 4 517-521 JOELF 2011-11-29T06:11:28Z 2011-11-29T06:11:28Z 2006 Conference Paper Li, Q., Ong, C.K., Wang, S.J., Wang, W.D., Chi, D.Z., Huan, A.C.H. (2006). Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing. Journal of Electroceramics 16 (4) : 517-521. ScholarBank@NUS Repository. https://doi.org/10.1007/s10832-006-9909-x 13853449 15738663 http://scholarbank.nus.edu.sg/handle/10635/28959 000241750700050 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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| topic |
High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering |
| spellingShingle |
High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering Li, Q. Ong, C.K. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing |
| description |
10.1007/s10832-006-9909-x |
| author2 |
BIOCHEMISTRY |
| author_facet |
BIOCHEMISTRY Li, Q. Ong, C.K. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. |
| format |
Conference or Workshop Item |
| author |
Li, Q. Ong, C.K. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. |
| author_sort |
Li, Q. |
| title |
Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing |
| title_short |
Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing |
| title_full |
Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing |
| title_fullStr |
Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing |
| title_full_unstemmed |
Growth and characterization of UHV sputtering HfO2film by plasma oxidation and low temperature annealing |
| title_sort |
growth and characterization of uhv sputtering hfo2film by plasma oxidation and low temperature annealing |
| publishDate |
2011 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/28959 |
| _version_ |
1781410678662234112 |