Effects of hydrogen and rf power on the structural and electrical properties of rf sputtered hydrogenated amorphous silicon carbide films
Journal of Applied Physics
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Main Authors: | Choi, W.K., Loo, F.L., Loh, F.C., Tan, K.L. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/80374 |
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Institution: | National University of Singapore |
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