Noise characteristics of radio frequency sputtered amorphous silicon carbide films

Journal of Applied Physics

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Bibliographic Details
Main Authors: Choi, W.K., Han, L.J., Chua, L.G.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/62486
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Institution: National University of Singapore