Noise characteristics of radio frequency sputtered amorphous silicon carbide films
Journal of Applied Physics
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sg-nus-scholar.10635-624862015-02-05T19:47:42Z Noise characteristics of radio frequency sputtered amorphous silicon carbide films Choi, W.K. Han, L.J. Chua, L.G. ELECTRICAL ENGINEERING Journal of Applied Physics 84 9 5057-5059 JAPIA 2014-06-17T06:51:36Z 2014-06-17T06:51:36Z 1998-11-01 Article Choi, W.K.,Han, L.J.,Chua, L.G. (1998-11-01). Noise characteristics of radio frequency sputtered amorphous silicon carbide films. Journal of Applied Physics 84 (9) : 5057-5059. ScholarBank@NUS Repository. 00218979 http://scholarbank.nus.edu.sg/handle/10635/62486 NOT_IN_WOS Scopus |
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Journal of Applied Physics |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Choi, W.K. Han, L.J. Chua, L.G. |
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Choi, W.K. Han, L.J. Chua, L.G. |
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Choi, W.K. Han, L.J. Chua, L.G. Noise characteristics of radio frequency sputtered amorphous silicon carbide films |
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Choi, W.K. |
title |
Noise characteristics of radio frequency sputtered amorphous silicon carbide films |
title_short |
Noise characteristics of radio frequency sputtered amorphous silicon carbide films |
title_full |
Noise characteristics of radio frequency sputtered amorphous silicon carbide films |
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Noise characteristics of radio frequency sputtered amorphous silicon carbide films |
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Noise characteristics of radio frequency sputtered amorphous silicon carbide films |
title_sort |
noise characteristics of radio frequency sputtered amorphous silicon carbide films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/62486 |
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