Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

10.1063/1.1500418

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書目詳細資料
Main Authors: Chew, K., Rusli, Yoon, S.F., Ahn, J., Ligatchev, V., Teo, E.J., Osipowicz, T., Watt, F.
其他作者: PHYSICS
格式: Article
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/93988
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