Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
10.1063/1.1500418
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sg-nus-scholar.10635-939882024-11-14T00:59:58Z Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F. PHYSICS CHEMISTRY 10.1063/1.1500418 Journal of Applied Physics 92 5 2937-2941 JAPIA 2014-10-16T08:30:47Z 2014-10-16T08:30:47Z 2002-09-01 Article Chew, K., Rusli, Yoon, S.F., Ahn, J., Ligatchev, V., Teo, E.J., Osipowicz, T., Watt, F. (2002-09-01). Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution. Journal of Applied Physics 92 (5) : 2937-2941. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1500418 00218979 http://scholarbank.nus.edu.sg/handle/10635/93988 000177548500110 Scopus |
| institution |
National University of Singapore |
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NUS Library |
| continent |
Asia |
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Singapore Singapore |
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NUS Library |
| collection |
ScholarBank@NUS |
| description |
10.1063/1.1500418 |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F. |
| format |
Article |
| author |
Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F. |
| spellingShingle |
Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F. Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| author_sort |
Chew, K. |
| title |
Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| title_short |
Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| title_full |
Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| title_fullStr |
Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| title_full_unstemmed |
Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| title_sort |
hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/93988 |
| _version_ |
1821188172629934080 |