Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

10.1063/1.1500418

Saved in:

Bibliographic Details
Main Authors:	Chew, K., Rusli, Yoon, S.F., Ahn, J., Ligatchev, V., Teo, E.J., Osipowicz, T., Watt, F.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/93988
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-93988
record_format	dspace
spelling	sg-nus-scholar.10635-939882023-10-25T22:44:19Z Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F. PHYSICS CHEMISTRY 10.1063/1.1500418 Journal of Applied Physics 92 5 2937-2941 JAPIA 2014-10-16T08:30:47Z 2014-10-16T08:30:47Z 2002-09-01 Article Chew, K., Rusli, Yoon, S.F., Ahn, J., Ligatchev, V., Teo, E.J., Osipowicz, T., Watt, F. (2002-09-01). Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution. Journal of Applied Physics 92 (5) : 2937-2941. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1500418 00218979 http://scholarbank.nus.edu.sg/handle/10635/93988 000177548500110 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.1500418
author2	PHYSICS
author_facet	PHYSICS Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F.
format	Article
author	Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F.
spellingShingle	Chew, K. Rusli Yoon, S.F. Ahn, J. Ligatchev, V. Teo, E.J. Osipowicz, T. Watt, F. Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
author_sort	Chew, K.
title	Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
title_short	Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
title_full	Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
title_fullStr	Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
title_full_unstemmed	Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
title_sort	hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/93988
_version_	1781786019697262592

Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Similar Items