Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

10.1063/1.1500418

Saved in:
Bibliographic Details
Main Authors: Chew, K., Rusli, Yoon, S.F., Ahn, J., Ligatchev, V., Teo, E.J., Osipowicz, T., Watt, F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/93988
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items