Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD

Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD

10.1016/S0925-9635(01)00635-5

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Bibliographic Details
Main Authors: Huang, Q.F., Yoon, S.F., Rusli, Zhang, Q., Ahn, J., Teo, E.J., Osipowicz, T., Watt, F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Carbon
CVD
Field emission
Nickel
Online Access:http://scholarbank.nus.edu.sg/handle/10635/93259
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/93259

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