Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD

Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD

10.1016/S0925-9635(01)00635-5

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Bibliographic Details
Main Authors: Huang, Q.F., Yoon, S.F., Rusli, Zhang, Q., Ahn, J., Teo, E.J., Osipowicz, T., Watt, F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Carbon
CVD
Field emission
Nickel
Online Access:http://scholarbank.nus.edu.sg/handle/10635/93259
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-932592023-10-30T21:16:26Z Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD Huang, Q.F. Yoon, S.F. Rusli Zhang, Q. Ahn, J. Teo, E.J. Osipowicz, T. Watt, F. PHYSICS CHEMISTRY Carbon CVD Field emission Nickel 10.1016/S0925-9635(01)00635-5 Diamond and Related Materials 11 3-6 1031-1035 DRMTE 2014-10-16T08:22:13Z 2014-10-16T08:22:13Z 2002-03 Article Huang, Q.F., Yoon, S.F., Rusli, Zhang, Q., Ahn, J., Teo, E.J., Osipowicz, T., Watt, F. (2002-03). Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD. Diamond and Related Materials 11 (3-6) : 1031-1035. ScholarBank@NUS Repository. https://doi.org/10.1016/S0925-9635(01)00635-5 09259635 http://scholarbank.nus.edu.sg/handle/10635/93259 000176046300151 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Carbon
CVD
Field emission
Nickel
spellingShingle Carbon
CVD
Field emission
Nickel
Huang, Q.F.
Yoon, S.F.
Rusli
Zhang, Q.
Ahn, J.
Teo, E.J.
Osipowicz, T.
Watt, F.
Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
description 10.1016/S0925-9635(01)00635-5
author2 PHYSICS
author_facet PHYSICS
Huang, Q.F.
Yoon, S.F.
Rusli
Zhang, Q.
Ahn, J.
Teo, E.J.
Osipowicz, T.
Watt, F.
format Article
author Huang, Q.F.
Yoon, S.F.
Rusli
Zhang, Q.
Ahn, J.
Teo, E.J.
Osipowicz, T.
Watt, F.
author_sort Huang, Q.F.
title Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
title_short Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
title_full Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
title_fullStr Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
title_full_unstemmed Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
title_sort characteristics of nickel-containing carbon films deposited using electron cyclotron resonance cvd
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/93259
_version_ 1781785890308227072

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