High temperature annealing of hydrogenated amorphous silicon carbide thin films

High temperature annealing of hydrogenated amorphous silicon carbide thin films

10.1016/S0040-6090(00)01867-8

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Bibliographic Details
Main Authors: Wang, Y., Lin, J., Huan, C.H.A., Feng, Z.C., Chua, S.J.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96796
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/96796

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